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Camera Lens Micro Dusts Semiconductor Cleaning Machine Di Water 2-Fluid Spray Cleaning Machine

Product Details

Place of Origin: Dongguan, China

Brand Name: SHENHUA

Certification: CE,UL

Model Number: CMC-800

Payment & Shipping Terms

Minimum Order Quantity: 1 set

Price: negotiation

Packaging Details: Vacuum +plywood case package, case size: 1100*1300*2250 mm(L*W*H)

Delivery Time: 30~40 days

Payment Terms: L/C, T/T, D/P, Western Union, Paypal, Money Gram

Supply Ability: 300sets per year

Get Best Price
Product Details
High Light:

dehydrator Semiconductor Cleaning Machine

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3HP Semiconductor Cleaning Machine

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dehydrator di water machine

Cleaning Method:
Double Fluid DI Waterspray Wash
Dry Method:
Centrifugal Dry
Cleaning Plate:
φ<550mm
DI Water Supply:
>17MΩ(Flow Rate>7RPM)
Cleaning Pressure:
3~8kg/cm2
Air Filter:
1umx1pcs; 0.01umx1pcs
Machine Size:
L800*W960*H1800
Machine Weight:
450KG
Cleaning Method:
Double Fluid DI Waterspray Wash
Dry Method:
Centrifugal Dry
Cleaning Plate:
φ<550mm
DI Water Supply:
>17MΩ(Flow Rate>7RPM)
Cleaning Pressure:
3~8kg/cm2
Air Filter:
1umx1pcs; 0.01umx1pcs
Machine Size:
L800*W960*H1800
Machine Weight:
450KG
Product Description

Product Description

CMC-800 Camera Lens Micro Dusts Semiconductor Cleaning Machine Di Water 2-Fluid Spray Cleaning Machine is mainly used to clean micro dusts on camera module products such as: Wafer, CMOS, Holder...etc. By using oure DI water scan spray cleaning technology, CMC-800 wash out very little micro dusts and by using 1000RPM centrifugal dry technology, CMC-800 can quickly make products dry.


Machine Features:
1.   Specially designed to clean dusts on camera module products.
2.   Mirror stainless steel structure, suitable for clean room.
3.   Clean plate is specially made according to products, clean plate can be changed according to different products cleaning requirement.
4.   PLC control, easy operation.
5.   Transparent explosion-proof front door, safe operation, convenient for observation.
6.   All machine displayed by meters. Cleaning status are monitoring at the time.
7.   2 stream clean, high cleaning precise, no damage to products, very few DI water consumption.
8.   Rotate spray rods, no secondary pollution.
9.   Equipped with static eliminator, cleaning room heat device, help to achieve best cleaning result.
10. Equipped with 2-level air filtration system, compressed air meet the standard of ISO8573.1.
11. Compact machine, smaller foot-print.
12. Use pure DI water, comply with RoHs standard.


Machine Spec:

Cleaning Plate Custom-made (cleaning plate diameter<550mm)
Clean method 2 stream clean
Dry method High speed centrifugal dry
Power supply AC380V 50HZ
Power 7KW
Power consumption Cleaning power : 3.5kw/h Standby power: 1kw/h
Rotate power 3HP
Environment filtration method 0.3μm;99.999%
Air filtration method 1μm×1;0.01μm×1
Centrifugal rotating speed 100-1500RPM
Clean pressure Water pressure:3-8Kgf/cm²     air pressure:0.2-0.5Mpa
DI water supply Flow rate:>7LPM  Resistivity:>17MΩ
Air consumption Pressure:0.45-0.7Mpa;flow rate:>30m³/H(good cleanness)
DI water let in diameter ø12mm soft hose or PT1/2″ female joint
Air supply diameter ø12mm hose
Water exit diameter PT 1″female joint
Air exit diameter 4″×2(need air-pumping device, air speed over 3m/sec)
Machine size 880mm(L)×960mm(W)×1880mm(H)
Machine weight 450KG

 
Machine picutre:

 

Camera Lens Micro Dusts Semiconductor Cleaning Machine Di Water 2-Fluid Spray Cleaning Machine 0